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2000
Volume 19, Issue 3
  • ISSN: 1573-4137
  • E-ISSN: 1875-6786

Abstract

Aims: This work uses the MACE method to synthesize Si- Ni/NiO to degrade organic pollutants by photocatalysis. Background: Photocatalytic degradation has been applied as an attractive solution to remove several organic pollutants. Heterostructured nanomaterials have become an interesting platform for investigation. Metal-assisted chemical etching (MACE) stands out as a promising technique because it is simple, low cost, and fast. Objective: Attain the degradation of methyl orange (MO) in the presence of silicon nanowires (Si) in heterojunction with Nickel/Nickel Oxide nanoparticles (Ni-NiO). Methods: Si were synthesized by metal (Ag) assisted chemical etching (MACE) of monocrystalline silicon wafers. Ni were non-electrolytically deposited on the Si (electroless method). The morphology of the Si- Ni/NiO was observed by SEM. Results: Heterogeneous photocatalytic degradation of methyl orange (CHNNaOS) in an aqueous solution at a concentration of 20 ppm had an efficiency of 66.5% after 180 min under UV irradiation. The MO degradation percentage was determined using UV-visible spectrophotometry. Conclusion: The Si-Ni/NiO were obtained composed mainly of Si covered by SiO decorated on the tips with Ni (II) in the form of NiO and a small amount of nickel metal. The removal efficiency obtained at 180 min of light exposure was 66.5%. After the photocatalysis tests, further oxidation of the Ni into NiO, was attributed to the reactive oxygen species in the aqueous medium based on the changes of the oxygen and Ni2p3/2 peaks by XPS. Other: Through XPS, the oxidation state of the Si- Ni/NiO was analyzed.

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/content/journals/cnano/10.2174/1573413718666220602144340
2023-05-01
2024-10-12
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