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2000
Volume 22, Issue 6
  • ISSN: 1570-1786
  • E-ISSN: 1875-6255

Abstract

The initial fundamental aspect examined in this study pertained to the chemical treatment of a silicon electrode in an acidic environment. The objective was to facilitate the deposition of organic or inorganic substances using electrochemical methods. Moreover, this study focused on investigating the nucleation process of poly(azacyclopenta-2,4-diene) on semiconductor substrates and exploring the incorporation of copper particles within the resulting film. The deposition of the polymer film onto the silicon electrode surface occurred through electrochemical oxidation of the monomer in a NaSO/HO solution. The introduction of copper particles into the polymer film was achieved through electrochemical reduction in aqueous solutions, leading to the dispersion of metallic particles within the polymer matrix. Notably, the surface morphology of the poly(azacyclopenta-2,4-diene)-metal composite films exhibited a coarser and more compact structural appearance compared to pure poly(azacyclopenta-2,4-diene) films. To gain further insights into the surface characteristics of the poly(azacyclopenta-2,4-diene) films, EDX analysis confirmed the successful incorporation of copper into the composite films.

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Synthesis of Metalopolymer Structure by Potentiostatic Deposition Method
Lett. Org. Chem. 22, 493 (2025); https://doi.org/10.2174/0115701786328491241215180213
/content/journals/loc/10.2174/0115701786328491241215180213
/content/journals/loc/10.2174/0115701786328491241215180213
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  • Article Type:     Research Article
Keyword(s): metals; Polymers; SEM; semiconductors; silicon; surface characterization

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