Recent Advances in Chemical Vapor Deposition

Chemical vapor deposition (CVD) represents the method-of-choice for thin film growth, as well as nanomaterials such as carbon nanotubes. Distinct advantages of this technique include low cost, and strict control over the resultant film stoichiometry, morphology, and thickness. The most critical component of a CVD process is the precursor that is employed. Hence, there has been a continuing interest in the development of new CVD precursors that would be useful for a range of thin film applications.