Skip to content
2000
Volume 4, Issue 3
  • ISSN: 1874-4648
  • E-ISSN: 1874-4656

Abstract

Silicon carbide (SiC) is an attractive material for high-temperature, high-power, high-frequency applications, due to its outstanding electrical, mechanical properties, and chemical inertness. SiC semiconductor technology has been developed widely since the commercialization of 6H-SiC and 4H-SiC bulk SiC wafers in 1990s. This paper reviews the recent patents on SiC semiconductor technology, introduces the achievements both in academy and industry for micromachining technologies, circuits devices. All these developments are driving high-performance SiC devices into harsh environment applications.

Loading

Article metrics loading...

/content/journals/mats/10.2174/1874464811104030191
2011-09-01
2025-05-20
Loading full text...

Full text loading...

/content/journals/mats/10.2174/1874464811104030191
Loading
This is a required field
Please enter a valid email address
Approval was a Success
Invalid data
An Error Occurred
Approval was partially successful, following selected items could not be processed due to error
Please enter a valid_number test